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Tips and tricks for making sandblasting masks.

from photoresist films RAYZIST Photomaks

For sandblasting we recommend abrasive (blasting material) aluminium oxide (Al2O3) - white corundum. Example of the use of individual fractions: F 220 - for sandblasting extra fine details F 180 - for standard glass sandblasting F 150 - F 120 - for sandblasting stone It

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Washing out the photoresists films is one of the key processes to achieve perfect sandblasting stencils. The washout should be done as quickly as possible, within 90 seconds (for 76 μm photoresist film). Extending the washout time increases the risk of

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BubbleEx is a simple tool for removing small bubbles under sandblasted photo film applied to a product. The individual brush wires create microscopic holes in the stencil that allow trapped air to escape from the film, but at the same

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