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RAYZIST Photomask films washing

RAYZIST Photomask films washing

Washing out the photoresists films is one of the key processes to achieve perfect sandblasting stencils.

The washout should be done as quickly as possible, within 90 seconds (for 76 μm photoresist film). Extending the washout time increases the risk of detail smearing. The blue emulsion (the matt side of the photoresist film) absorbs (saturates) water and ambient moisture.

The condition for a quick washout is that you have carried out the previous steps of making the sandblasting masks correctly:

  1. You have used print film with a well made and opaque print.
  2. You have print film at the correct time, optimized according to the parameters of your exposure unit.
  3. The print film was perfectly pressed to the matte side of the photoresist film. We recommend the use of vacuum exposure units or units with a pressurized flexible membrane.

Factors influencing the quality of photoresist film washout:

  • Increase the washing speed by pressure rather than water temperature.
  • Wash evenly from top to bottom over the entire area of the photoresist film.
  • Check the status of the washout and terminate the washout in time.

The wash nozzle should produce:

  • a fine dusting, as fine as the details on your sandblasted motive
  • flat cone with an angle of 60°
  • the nozzle bore should have a diameter of around 0.7 – 0.8 mm
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